136
39
th IEEE PHOTOVOLTAIC SPECIALISTS CONFERENCE
H30
(350)
Passivation of different black silicon
surfaces by ALD deposited Al
2
O
3
Martin Otto
1
,
Matthias Kroll
2
,
Thomas Käsebier
2
,
Xiaopeng Li
1
,
Benjamin Gesemann
1
,
Kevin
Füchsel
2,3
,
Johannes Ziegler
1
,
Alexander N.
Sprafke
1
,
Ralf B. Wehrspohn
1,4
1
Martin-Luther-University (MLU), FG µMD, Halle
(
Saale), Germany,
2
Friedrich-Schiller-University
(
FSU), Institute for Applied Physics, Jena,
Germany,
3
Fraunhofer Institute for Applied Optics
and Precision Engineering (IOF), Jena, Germany,
4
Fraunhofer Institute for Mechanics of Materials
(
IWMH), Halle (Saale), Germany
H32
(351)
Counterdoping with Patterned Ion
Implantation
Udo Römer
1
,
Robby Peibst
1
,
Tobias Ohrdes
1
,
Yevgeniya Larionova
1
,
Nils-Peter Harder
1,2
,
Andreas Grohe
3
,
Daniel Stichtenoth
3
,
Tobias
Wütherich
3
,
Claus Schöllhorn
3
,
Hans-Joachim
Krokoszinski
3
,
John Graff
4
,
Rolf Brendel
1,5
1
Institute for Solar Energy Research Hamelin
(
ISFH), Emmerthal, Germany,
2
Institute of
Electronic Materials and Devices, Leibniz
Universität Hannover, Hanover, Germany,
3
Bosch
Solar Energy AG, Arnstadt, Germany,
4
Applied
Materials/Varian Semiconductor Equipment
Associates, Inc., Gloucester, MA, USA,
5
Institute
of Solid State Physics, Leibniz Universität
Hannover, Hanover, Germany
H34
(352)
Effect of Initial Oxidized Layer Condition
on Passivation Quality of AlO
x
films Deposited
by Atomic Layer Deposition Technique at
Room Temperature
Chikako Sakai
1,3
,
Shunsuke Yamamoto
1,3
,
Shohei
Miki
1,3
,
Koji Arafune
1,3
,
Yasushi Hotta
1,3
,
Haruhiko
Yoshida
1,3
,
Atsushi Ogura
2,3
,
Shin-ich Satoh
1,3
1
Univ. of Hyogo, 2167 Shosha, Himeji, Hyogo
671-2280,
Japan,
2
Meiji Univ., 1-1-1 Higashimita,
Tama-ku, Kawasaki, Kanagawa 214-8571, Japan,
3
JST-CREST, 4-1-8 Hontyou, Kawaguchi, Saitama
332-0012,
Japan
H36
(353)
Study and manipulation of charges
present in silicon nitride films
Vivek Sharma, Clarence Tracy, Dieter Schroder,
Marco Flores, Bill Dauksher, Stuart Bowden
Arizona State University, Tempe, AZ, USA
H38
(354)
Mass Production Spray Pyrolysis Al
2
O
3
for High Efficiency Crystalline Silicon Solar
Cells
Yu Sheng-Min
1
,
Wang Terry Tai-Jui
1
,
Chen Yi-Fan
1
,
Jih Far-Wen
2
,
Hong Hong-Ming
2
,
Huang Lien-Te
2
,
Huang Lien-Shen
2
,
Sun Wen-Ching
1
1
Industrial Technology Research Institute,
Hsinchu, Taiwan,
2
Infina Technology Co.,Ltd.,
Taoyuan, Taiwan
TECHNICAL PROGRAM
